Jacob Feldgoise and Hanna Dohmen shared their expert insights in an article published by Bloomberg. The article discusses China’s ongoing struggle to develop advanced semiconductor lithography systems—technology crucial to its ambitions for technological self-sufficiency amid its trade and tech rivalry with the United States. Despite notable gains in certain chip fabrication tools, Chinese firms like Shanghai Micro Electronics Equipment Group (SMEE) remain significantly behind global leaders such as ASML and Nikon in the critical field of lithography.

Feldgoise and Dohmen emphasized the severity of China’s limitations, writing, “This demonstrates that lithography remains the critical chokepoint.” The article also draws on findings from their recent CSET report, Inside Beijing’s Chipmaking Offensive, which outlines China’s market share gains in semiconductor manufacturing equipment based on data from CSET ETO’s updated Supply Chain Explorer.

To read the full article, visit Bloomberg.